TomoWISE — Beamline components

Reference inventory of the physical hardware that will make up the TomoWISE beamline at MAX IV, walked from the source to the detector. Source for everything below is the TomoWISE Technical Design Report dated 2025-03-31 (main applicant: Olof Karis, MAX IV).

Warning

Under construction. TomoWISE is in the design phase. Every number below is the design specification from the TDR, not a commissioned measurement. PV names are TBD — MAX IV uses Tango / Sardana, not EPICS, so the eventual control surface will look different from the 2-BM pages.

Overview

TomoWISE will sit at straight section 7 of the MAX IV 3 GeV ring, fully dedicated to high-resolution full-field tomography of materials in the 20–65 keV range. Two independent insertion devices share the 4.5 m straight, feeding three optical schemes and two endstations (microtomography at ~45 m, nanotomography at 49–51 m).

Walk from source to detector (z values are distance from the centre of the straight section, mm):

Storage ring straight section 7
  -> CPMU14 + 3T3PW                  (two sources, 4.5 m straight)
  -> Front End                       (z ≈ 5–17 m: FM1, FM2, MSM, HA)
  -> Optics hutch                    (z ≈ 22.5–32.5 m)
       DM1 (BM + CVD + WBS + BPM1)
       -> PFU (Si power filters)
       -> MLM (multilayer monochromator)
       -> DM2 (white-beam stop, MBS, BPM2)
       -> Safety unit (HA, SS1, SS2)
  -> Microtomography endstation       (z ≈ 45 m; rotary, sample table, slits, fast shutter)
  -> Nanotomography endstation        (z ≈ 49–51 m; KB mirror pair + sample stage)
  -> Detector gantry                  (shared, on 7 m rails between endstations)

Beam delivery

Insertion devices

Two complementary sources share the 4.5 m straight. They are operated independently (radiated power and beam footprint differ enough that simultaneous operation is not allowed).

CPMU14 — Cryogenic Permanent Magnet Undulator

Role:

Primary source for high-flux microtomography (with or without MLM) and for nanotomography (with KB).

Family:

InsertionDevice

Type:

in-vacuum cryogenic permanent magnet undulator (Pr₂Fe₁₄B magnets, vanadium permendur poles, cooled to 77 K)

Period:

14 mm

Length:

2.0 m (cryostat 2.67 m)

Minimum gap:

3.8 mm

Maximum K_eff:

1.84

Power at 500 mA:

11.1 kW

RMS phase error:

< 3°

Position in straight:

-505 mm from centre

Beam divergence:

~100 µrad

Beam size at sample (45–48 m):

~1.5 × 2.4 mm² to 4.5 × 4.5 mm²

Flux:

• 5 × 10¹⁶ ph/s @ 20 keV (1 × 2.4 mm² beam, ΔE/E = 1 × 10⁻²)

• 3 × 10¹⁶ ph/s @ 33 keV (2 × 2.4 mm², MLM)

• 1 × 10¹⁵ ph/s @ 63 keV (2 × 2.4 mm², MLM)

• 4 × 10¹⁶ ph/s broadband centred at 55 keV (CVD + PF + MF)

3T3PW — 3-Tesla 3-Pole Wiggler

Role:

Wide-field large-FOV microtomography (broadband white beam, no MLM, no KB).

Family:

InsertionDevice

Type:

out-of-vacuum 3-pole wiggler (similar to the device recently commissioned at SESAME)

Field:

3 T

Magnetic length:

412 mm (occupies 0.7 m of the straight)

Minimum gap:

11 mm

Position in straight:

+1734 mm from centre

Beam divergence:

1 mrad (h) × 0.1 mrad (v)

Beam size at sample:

45 × 4.5 mm² (h × v)

Flux:

~10¹⁵ ph/s @ 25–65 keV broadband (CVD filter only)

Total radiated power:

1.6 kW at 500 mA

Front End

The Front End is shared by both insertion devices and must safely switch its acceptance between the narrow CPMU14 beam (100 µrad) and the wide 3T3PW beam (1 mrad horizontal). Layout, source to downstream:

CPMU + 3T3PW -> FM1 -> FM2 -> MSM -> HA -> MM1 -> MM2

Element distances and absorbed power (from TDR Table 7.1, distance from CPMU14):

Element	z [mm]	Opening X	Opening Y	Power absorbed
CPMU14	0	—	—	source (11.3 kW out)
Dipole mask	5767	1.977 mrad	1.977 mrad	—
Reference	10000	3.000 mrad	3.000 mrad	—
FM1	14000	1.100 mrad	1.100 mrad	200 W
FM2	15000	1.100 mrad	0.100 mrad	6.9 kW
MSM (wide)	16500	1.100 mrad	0.100 mrad	0 W (4.2 kW out)
MSM (narrow)	16500	0.100 mrad	0.100 mrad	3.33 kW (0.82 kW out)
Heat absorber	17000	1.176 mrad	0.706 mrad	0.82 kW (0 kW out)

FM1 — first Fixed Mask

Role:

1 × 1 mrad² absorbing aperture (calculated from the 3T3PW centre); MAX IV standard design.

Family:

BeamMask

Absorbs:

~2 kW

FM2 — second Fixed Mask

Role:

1.1 × 0.1 mrad² acceptance — transmits the wide 3T3PW horizontal beam while clipping the vertical.

Family:

BeamMask

Absorbs:

up to 7 kW from the CPMU14 source

MSM — Movable Safety Mask

Role:

PSS-grade switchable mask — provides either the wide (1.1 mrad horizontal) or narrow (0.1 mrad horizontal) acceptance matched to the selected insertion device. Interlocked to the CPMU14 gap so the device cannot close to its minimum gap unless the mask is in the safe (narrow) position.

Family:

BeamMask (PSS-grade)

Mechanism:

pneumatic actuator with PSS-grade switches and hard stops; mm-accuracy positioning, <100 µm lateral parasitic motion

FEA-predicted distortion:

~100 µm on the long edge under CPMU14 at minimum gap — <1 % effect on effective opening

Aperture (wide / narrow):

1.1 × 0.1 mrad² / 0.1 × 0.1 mrad²

Heat Absorber + Movable Masks (HA, MM1, MM2)

Role:

HA protects the Safety Shutter (4 kW absorption budget for worst-case interlock fault). MM1/MM2 are MAX IV standard movable masks with increased horizontal travel to match the 1 mrad 3T3PW acceptance — used to fine-tune downstream acceptance.

Family:

BeamMask

Beamline optics (optics hutch, z = 22.5–32.5 m)

All optical elements with their longitudinal positions from the straight-section centre (TDR Table 8.1):

Component	Short	Distance [m]	Comment
FE trigger unit	FE	23.00	—
Diagnostic Module 1	DM1	—	beam-defining mask + collimator
Fixed Mask 1	FM1	23.61	—
Bremsstrahlung Collimator	BC1	23.85	—
Diamond Filter	CVD	24.05	0.35 mm CVD diamond, water-cooled
White-beam slits	WBS	24.28	water-cooled Cu, 60 µrad opening
Beam Position Monitor 1	BPM1	24.57	X-ray BPM
Power Filters unit	PFU	25.20	two Si wedges (see PFU block)
Multilayer Monochromator	MLM	25.90	two W/Si (or W/B₄C) bilayers, d = 2.5 nm
Diagnostic Module 2	DM2	—	—
White-beam stop	WBS2	27.95	used when MLM is in beam
Bremsstrahlung Collimator	BC2	28.06	—
Monochromatic Beam Slits	MBS	28.28	—
Beam Position Monitor 2	BPM2	28.53	X-ray BPM
Safety unit	SU	31.83	HA + SS1 + SS2
Experimental hutch wall	—	32.50	—

DM1 / DM2 — Diagnostic modules

Role:

DM1 hosts the Beam-defining Mask (BM, water-cooled Cu with 60 µrad opening), bremsstrahlung collimator, white-beam slits, and BPM1. DM2 hosts the white-beam stop (blocks transmitted beam when MLM is in use), monochromatic beam slits, and BPM2.

Family:

Diagnostics

CVD diamond filter

Role:

First filter in the optics hutch — reduces heat load on everything downstream.

Family:

Filter

Material:

CVD diamond, 0.35 mm thick

Frame:

35 × 8 mm² plate on a copper frame with 30 × 3 mm² aperture

Cooling:

thermal contact to the copper frame, thermocouple monitor

Transmission:

95 % @ 20 keV, 50 % @ 10 keV, ≈ 0 % for lowest CPMU14 harmonics

PFU — Power Filters Unit

Role:

Tunable Si wedge attenuator — fine spectrum / flux control without engaging the MLM.

Family:

Filter

Mechanism:

two identical water-cooled Si wedge crystals on vertical translation stages; wedge angle 3°, thickness varies from 6 mm to 0.2 mm along the wedge.

Dimensions:

a = 7 mm, b = 6 mm, c = 10 mm, d = 120 mm, e = 140 mm

Effective thickness range:

0.2 to 25 mm

Attenuation:

up to 80 % at 65 keV, 95 % at 45 keV

Metal Filter unit (MF)

Role:

Third filter stage at the start of the experimental hutch. Tunes X-ray transmission from 10⁻⁴ to 1 across the operational range by combining Fe and Cu plates of different thicknesses.

Family:

Filter

Design:

NanoMAX-style carriages with multiple Fe / Cu plate slots

Mounted on:

experimental-hutch end-wall

MLM — Multilayer Monochromator

Role:

Horizontally-deflecting two-bounce multilayer monochromator covering 20–65 keV. CPMU14 only — designed so the mirrors can be translated out of the way for the wide 3T3PW beam.

Family:

Monochromator

Geometry:

horizontal Bragg, fixed pitch (Bragg-angle scan via rotation), 500 mm longitudinal separation between mirrors, lateral offset on 2nd crystal (up to 8.55 mm) to track energy

Coating:

W/Si (or W/B₄C) bilayers, d = 2.5 nm, 140 bilayers

Substrate:

40 × 20 × 320 mm³ (x, z, y) Si crystals

First-mirror distance:

25.9 m from source

Max beam at 1st mirror (@ 44 µrad):

300 × 1 mm² (h × v)

Max power on 1st mirror:

100 W

Energy range:

20 – 65 keV

Energy bandwidth:

ΔE/E ≈ 1.8 %

Bragg-angle range:

3.84 – 12.6 mrad

Slope error:

0.05 µrad

Surface roughness:

< 0.15 nm RMS

Bragg resolution:

0.5 µrad

Motors (TDR Table 8.4):

Axis	Range	Resolution	Repeatability	Function
Pitch (Ry)	0 – 20 mrad	< 8 µrad	< 2 µrad	Bragg angle → energy
Ty	±5 mm	< 10 µm	< 10 µm	Crystal-in-beam optimisation
Tx	+3 / −15 mm	< 5 µm	< 5 µm	Chamber lateral; carries C2x
C2x	0 – 15 mm	< 5 µm	< 5 µm	2nd-crystal lateral (energy track)
C2_pitch	2 mrad	—	—	Fine pitch of 2nd crystal

KB pair — Kirkpatrick-Baez focusing mirrors (nano-tomography)

Role:

Source for cone-beam projection microscopy at the nanotomography endstation. Demagnifies the source spot to ~200 nm so the sample can sit downstream of the focus.

Family:

Mirror (KB pair)

Type:

fixed-curvature graded multilayer mirrors (two pairs side by side — one optimised for 30 keV, one for 45 keV)

Mounted on:

KB vacuum chamber at the entrance of the experimental hutch (~48.85 / 49.00 m from source)

Substrate:

VFM 175 × 20 × 40 mm³; HFM 90 × 20 × 40 mm³

Substrate shape:

elliptical cylinder

Mirror-centre-to-focal-point:

VFM 210 mm; HFM 60 mm

Grazing angle (30 keV / 45 keV):

VFM 7.49 / 4.27 mrad; HFM 0.50 / 0.285 mrad

Multilayer period (30 keV / 45 keV):

VFM 20 / 27.6 / 31.5 Å; HFM 20 / 48.35 / 56.3 Å

Focal spot (h × v):

205 × 196 nm @ 30 keV; 196 × 80 nm @ 45 keV

Numerical aperture (h × v):

5.5 × 2.8 mrad @ 30 keV; 4.0 × 2.5 mrad @ 45 keV

Total flux at focus:

1.29 × 10¹³ ph/s @ 30 keV; 2.77 × 10¹² ph/s @ 45 keV

Power at focus:

72 mW @ 30 keV; 20 mW @ 45 keV

Safety Shutters (SS1, SS2) and Heat Absorber

Role:

SU = Heat Absorber + two Safety Shutters at the end of the optics hutch, before the experimental-hutch wall. SS1 / SS2 gate the beam between optics and experiment hutches; HA absorbs worst-case interlock-fault power so the shutters stay within their thermal budget.

Family:

Shutter

HA thermal budget:

4 kW

Position:

31.83 m (Safety unit) / 32.50 m (experimental hutch wall)

Operation modes

Pre-defined optical configurations (TDR Table 8.7 / 8.8):

Imaging mode	Source	Filters	Monochromator	KB focusing
Standard / high-throughput microtomography	CPMU14	< Si 1 mm	MLM	no
High speed, <1 µm pixel, 1–2 mm FOV	CPMU14	none → Si+metals	MLM → none	no
High speed, >1 µm pixel, large FOV	3T3PW	Si + metals	none	no
Large or highly attenuating samples	3T3PW	Si + metals	none	no
Nano-tomography	CPMU14	none	MLM	yes

Experimental stations

Microtomography endstation (z ≈ 45 m)

Two beams reach this station: the monochromatic CPMU14 beam (1 × 2.4 mm² @ 20 keV / 2 × 2.8 mm² above 33 keV) and the broadband 3T3PW beam (45 × 4.5 mm² h × v).

Sample table

Role:

Floor-referenced support for the rotary stage and the sample positioning stack. Built in-house by MAX IV; air-pad removable for major reconfiguration.

Family:

OpticalTable

Position:

45 m from source, fixed

Surface-to-beam:

390 mm

Degrees of freedom:

• Xt — sample-tower X translation (perpendicular to beam): ±100 mm range, 0.3 µm resolution, < 1 µm straight-line accuracy

• Yt — sample-tower Y (vertical, imaging-height + flat-field offset): +50 / -150 mm range, 0.5 µm resolution, < 1 µm straight-line accuracy

• β — tilt to align ωy rotation axis perpendicular to the incident beam: 1.2°, 5 mdeg resolution, 10 mdeg repeatability

Rotary stage (ω_y)

Role:

Sample rotation axis — the master device that triggers all other devices during acquisition.

Family:

RotaryStage

Model (target):

Lab Motion Systems RT100AX (continuous rotation, slip-ring built in, TTL position output)

Mounted on:

sample table

Travel:

continuous

Max speed:

1200 rpm (20 revolutions per second)

Resolution:

1 mdeg

Repeatability:

3 mdeg

Straight-line accuracy / eccentricity:

0.03 µm (radial), 2 mdeg, 200 nm wobble, 75 mm above stage surface

Load capacity:

2 kg axial, 10 kg normal

Encoder output:

TTL, 3600 pulses per rotation — drives detector triggering downstream

Radial / axial error motion:

< 100 nm / < 50 nm

Sample positioning stage (Xs, Zs)

Role:

Fine positioning of the sample on the rotation axis.

Family:

LinearStage (pair)

Model (target):

Lab Motion Systems XY150B-12

Mounted on:

top of the rotary stage (co-rotates with ω_y)

Travel:

±6 mm each axis

Resolution:

0.1 µm

Precision repeat:

1 µm

Laminography tilt (α)

Role:

Tilt stage below the rotation axis enabling laminography for flat samples (PCBs, slabs).

Family:

TiltStage

Travel:

25°

Precision repeat:

0.1°

Resolution:

50 mdeg

Precise slits (sample-side)

Role:

Crop the beam to the chosen field of view immediately upstream of the sample (180 mm above the rotation axis), to minimise out-of-field dose.

Family:

Slits

Reference design:

JJ X-ray IB-C50-air

Max opening:

50 × 5 mm (h × v)

Slit precision:

50 µm

Positioning range (X / Y):

20 mm / 10 mm

Positioning precision:

50 µm

Fast shutter (sample-side)

Role:

Sub-frame X-ray gating, 30–50 mm upstream of the sample slits. Two shutters in parallel:

• Mode 2 (high-speed CPMU14): Arinax Colibri, < 5 ms opening, 2 mm aperture.

• Mode 1 (wide 3T3PW): Innospexion ultrafast shutter, < 10 ms opening, > 45 × 4.5 mm² aperture.

Family:

Shutter

Slip ring

Role:

Allows electrical / fluid connections to a continuously rotating sample environment (in situ / operando).

Family:

SlipRing

Channels:

30–40

Drive:

secondary rotation stage synchronised with the precision rotary (up to 1000 rpm)

Cable feedthrough:

≥ 15 mm diameter hole through the main rotary

Optional modules

• Horizontal-rotation loading rig — 10 kN tension/compression rig (Psylotech xTS-2022.10-V3) installed in place of the standard vertical-rotation tower; rotates around the horizontal axis to image long-thin samples in a single rotation.

• kHz tomography module — servo-motor add-on capable of 0.5–1 kHz rotation at the cost of 10-µm-scale spatial resolution.

Nanotomography endstation (z ≈ 49–51 m)

Cone-beam projection microscopy. Sample sits downstream of the KB focus (in the diverging cone), spatial resolution and FOV are tuned by sliding the sample between focus and detector. Detector gantry extends to 52 m (hutch wall).

Role:

200-nm-class spatial resolution via geometrical magnification through the KB-formed nanofocus.

KB pair:

see Beamline optics → KB pair.

Sample stage:

TBD in TDR (specification deferred to procurement); needs Abbe-error performance compatible with 200-nm resolution.

Detector system (shared gantry)

One detector system serves both endstations via a gantry that rolls on 7 m long floor rails between the two stations. The nanotomography station can host a second detector for fast swapping; in that case only the sample moves between stations and the detector gantry is untouched.

A removable, modular flight tube (1 mbar vacuum) covers the length of the experimental hutch — terminating just upstream of the sample slits in microtomography mode, or all the way to the KB chamber in nanotomography mode.

Microscopes

Microscope	Magnification	NA	Used in
MicLFOV — Large field-of-view scope	1–2×	> 0.2	Mode 1 (large samples, 3T3PW)
MicHR — High-resolution scope	4×, 10×, 20×	> 0.4	Modes 2 / 3 (standard / nano)

Both microscopes accept all four beamline cameras (sensors up to 60 mm diagonal).

Cameras

Four CMOS-class cameras are planned. Specific models will be chosen in the second project year — these are the design targets:

Cam	Description	Used with	Scintillator (LuAG:Ce)
I	16–25 Mpix, 16-bit sCMOS, medium speed (100–150 fps)	High-NA objective	7–15 µm
II	4 Mpix, 12-bit CMOS, > 50 000 fps	High-NA objective	20 / 50 / 100 / 150 µm
III	≈ 4 Mpix streaming, > 2 000 fps	High-NA objective	20 / 50 / 100 / 150 µm
IV	150 Mpix, large sensor (54 × 40 mm, 3.76 µm pixel)	1× or 5–10× objective	(per microscope)

Note: the high-speed camera (II) must run at least 5 kHz in full-frame and up to 100 kHz with cropped sensor. Camera IV matches the device already procured for DanMAX.

Detector positioning stages (gantry)

Role:

Carry the chosen microscope and camera between the two endstations and along the beam at each station.

Family:

LinearStage

Axes:

• Xd — gantry-mounted fine X translation (perpendicular to beam)

• Yd — gantry-mounted fine Y translation (vertical)

• Zd — gantry translation along the beam, on 7 m floor rails

Rails:

fixed on the floor, both sides of the sample-table

Range:

micro-tomography station (45 m) to hutch wall (52 m)

Capacity:

two sets of detector optics can be mounted simultaneously, either side-by-side (X-swappable) or in series along Z (semi-transparent upstream optics + downstream pickup)

Optics standard

Optique Peter is the reference vendor for the microscope optics (same vendor as the 2-BM detector — see Beamline components, Optique Peter MICRX080), though MAX IV may pick a smaller vendor with comparable specifications. Decision in project year 2.

Trigger and synchronisation

The rotary stage (Lab Motion RT100AX) emits a TTL pulse train on the encoder — 3600 pulses per revolution — and is the master clock for all other devices during acquisition. As of the TDR no FPGA conditioner is specified (no equivalent of 2-BM’s softGlueZynq) — the rotary TTL output is expected to feed the camera trigger inputs directly. This may evolve once the camera trigger requirements are firm.

References

• TomoWISE Technical Design Report, 2025-03-31, MAX IV Laboratory (TomoWISE_TDR_final_revised.pdf, 87 pages). Main applicant Olof Karis; co-applicants Dina Carbone, Rajmund Mokso (MAX IV / DTU), Stephen Hall (Lund University).

• For the existing TomoScan-protocol collaboration with DanMAX (Sardana/Tango ↔ EPICS comparison), see DanMAX TomoScan — APS collaboration.

• For the 2-BM beamline reference page this template mirrors, see Beamline components.